发明名称 |
SURFACE WAVE PLASMA PROCESSING SYSTEM AND METHOD OF USING |
摘要 |
<p>A SWP source includes an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent the plasma. A power coupling system is coupled to the EM wave launcher and configured to provide the EM energy to the EM wave launcher for forming the plasma. A cover plate coupled to the plasma surface of the EM wave launcher protects the EM wave launcher from the plasma.</p> |
申请公布号 |
KR20070101228(A) |
申请公布日期 |
2007.10.16 |
申请号 |
KR20077007996 |
申请日期 |
2005.08.10 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
CHEN LEE;TIAN CAIZ HONG;MATSUMOTO NAOKI |
分类号 |
H05H1/24;H01J37/32;H05H1/34 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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