发明名称 Silicon layer production method and solar cell production method
摘要 A solar cell is produced by dipping a multicrystalline silicon substrate 28 in a solution 24 containing silicon, growing a silicon layer on the substrate 28 while decreasing with time the temperature drop rate of the solution during the dipping of the substrate in the solution, and forming a pn junction in the silicon layer. Thereby, there is provided a silicon layer production method that can form a thick layer while restraining the degree of roughness, whereby a low-cost, multicrystalline-silicon solar cell production method is provided that realizes both a large current and a high FF.
申请公布号 US7282190(B2) 申请公布日期 2007.10.16
申请号 US20050563115 申请日期 2005.05.17
申请人 CANON KABUSHIKI KAISHA 发明人 MIZUTANI MASAKI;NISHIDA SHOJI;NAKAGAWA KATSUMI
分类号 C01B33/02;C01B33/26;C30B15/20;C30B19/02;C30B19/10;C30B29/06;H01L21/208;H01L31/04;H01L31/18 主分类号 C01B33/02
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