ACID AMPLIFIER AND CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION INCLUDING THE SAME

摘要

An acid amplifier, a photoresist composition containing the acid amplifier, and a method for forming a photoresist pattern by using the composition are provided to improve the sensitivity of chemically amplified resist, the contract of exposure part and nonexposure part and the adhesive strength to a substrate. An acid amplifier is represented by the formula 1, wherein R1 is a C1-C3 alkyl group, a fluoroalkyl group, a C6-C10 aryl group, or an alkylaryl group; and R2 is a substituted or unsubstituted C1-C30 alkyl, cycloalkyl, aryl or arylalkyl group containing a hydroxyl group. The photoresist composition comprises 0.05-20 wt% of the acid amplifier; 1-30 wt% of an acid labile photosensitive polymer; 0.05-20 parts by weight of a photoacid generator based on 100 parts by weight of the photosensitive polymer; and the balance of an organic solvent.