发明名称 Elastomeric mask and use in fabrication of devices
摘要 An elastomeric mask is provided that allows deposition of a variety of materials through mask openings. The mask seals effectively against substrate surfaces, allowing simple deposition from fluid phase, gas phase, and the like or removal of material using gaseous or liquid etchants. The mask then can be simply peeled from the surface of the substrate leaving the patterned material behind. Multi-layered mask techniques are described in which openings in an upper mask allow selected openings of a lower mask to remain un-shielded, while other openings of the lower mask are shielded. A first deposition step, following by re-orientation of the upper mask to expose a different set of lower mask openings, allows selective deposition of different materials in different openings of the lower mask. Pixelated organic electroluminescent devices are provided via the described technique.
申请公布号 US7282240(B1) 申请公布日期 2007.10.16
申请号 US20000694074 申请日期 2000.10.20
申请人 PRESIDENT AND FELLOWS OF HARVARD COLLEGE 发明人 JACKMAN REBECCA J.;DUFFY DAVID C.;WHITESIDES GEORGE M.;VAETH KATHLEEN;JENSEN KLAVS F.
分类号 B05D1/32;B41C1/14;G03F1/00;G03F1/08;G03F7/00;G03F7/12;H01L27/32;H01L51/50;H05B33/10 主分类号 B05D1/32
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