发明名称 |
Reticle thermal detector |
摘要 |
A reticle thermal detector for measuring a thermal condition and distortion of a reticle prior to photolithography is disclosed. The reticle thermal detector includes a mechanism for determining a degree of distortion of the reticle. An alarm is connected to the mechanism for activation by the mechanism when the reticle is distorted. The invention further includes a novel method of enhancing the quality of circuit pattern images formed on a wafer during photolithography.
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申请公布号 |
US7283198(B2) |
申请公布日期 |
2007.10.16 |
申请号 |
US20040999624 |
申请日期 |
2004.11.30 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
KUO YANG-KUAO |
分类号 |
G03B27/52;G03B27/42;G03B27/62;G03C5/00 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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