发明名称 Reticle thermal detector
摘要 A reticle thermal detector for measuring a thermal condition and distortion of a reticle prior to photolithography is disclosed. The reticle thermal detector includes a mechanism for determining a degree of distortion of the reticle. An alarm is connected to the mechanism for activation by the mechanism when the reticle is distorted. The invention further includes a novel method of enhancing the quality of circuit pattern images formed on a wafer during photolithography.
申请公布号 US7283198(B2) 申请公布日期 2007.10.16
申请号 US20040999624 申请日期 2004.11.30
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 KUO YANG-KUAO
分类号 G03B27/52;G03B27/42;G03B27/62;G03C5/00 主分类号 G03B27/52
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