发明名称 POSITIVE-WORKING RESIST COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION
摘要 This invention provides a positive-working resist composition comprising a resin component (A), of which the alkali solubility is increased upon the action of an acid, and an acid generating agent component (B) capable of generating an acid upon exposure. In the positive-working resist composition, the resin component (A) is a mixture of a copolymer (A1) comprising constitutional units (a1) derived from an acid dissociative dissolution inhibiting group-containing acrylic ester, constitutional units (a2) derived from a lactone-containing monocyclic group-containing methacrylic ester, and constitutional units (a3) derived from an acrylic ester containing a polar group-containing polycyclic group, and a copolymer (A2) having a structure different from the copolymer (A1) and having a lower hydrophilicity than the copolymer (A1).
申请公布号 KR20070101316(A) 申请公布日期 2007.10.16
申请号 KR20077018291 申请日期 2007.08.09
申请人 TOKYO OHKA KOGYO CO., LTD. 发明人 TAKESHITA MASARU
分类号 G03F7/039 主分类号 G03F7/039
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