发明名称 3-D transformer for high-frequency applications
摘要 A stressed metal technology may fabricate high-Q, three-dimensional microelectronic inductors and transformers. The fabrication method may allow the production of inductors and transformers on high-resistivity silicon substrate and with metal deposition of Au and Cr that is fully compatible with semiconductor fabrication technologies. The produced inductors and transformers exhibit Q factors>60 at frequencies of 3 to 7 GHz. High efficiency, high-Q transformers with coupling factors 0.6<k<0.9 may be created with very high self-resonance frequencies.
申请公布号 US7283029(B2) 申请公布日期 2007.10.16
申请号 US20050294721 申请日期 2005.12.05
申请人 PURDUE RESEARCH FOUNDATION 发明人 WEON DAE-HEE;MOHAMMADI SAEED;JEON JONG-HYEOK;KATEHI LINDA P. B.
分类号 H01F5/00;H01F7/06 主分类号 H01F5/00
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