发明名称 |
3-D transformer for high-frequency applications |
摘要 |
A stressed metal technology may fabricate high-Q, three-dimensional microelectronic inductors and transformers. The fabrication method may allow the production of inductors and transformers on high-resistivity silicon substrate and with metal deposition of Au and Cr that is fully compatible with semiconductor fabrication technologies. The produced inductors and transformers exhibit Q factors>60 at frequencies of 3 to 7 GHz. High efficiency, high-Q transformers with coupling factors 0.6<k<0.9 may be created with very high self-resonance frequencies.
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申请公布号 |
US7283029(B2) |
申请公布日期 |
2007.10.16 |
申请号 |
US20050294721 |
申请日期 |
2005.12.05 |
申请人 |
PURDUE RESEARCH FOUNDATION |
发明人 |
WEON DAE-HEE;MOHAMMADI SAEED;JEON JONG-HYEOK;KATEHI LINDA P. B. |
分类号 |
H01F5/00;H01F7/06 |
主分类号 |
H01F5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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