发明名称 MASK AMD METHOD OF MANUFACTURING THE SAME
摘要 <p>A mask and its forming method are provided to prevent a bad pattern of an organic light emitting layer by forming an opening of a uniform width in a region corresponding to a light emitting region. A mask includes a first region(A1) corresponding to a light emitting region of a display device, a second region(A2) corresponding to a non-light emitting region around the light emitting region, and an opening(111) extending from the first region to the second region and formed in a slit shape. The opening has a first portion(112) positioned in the first region and formed in a through-hole shape, and a second portion(113) positioned in the second region and formed in a groove shape.</p>
申请公布号 KR100766902(B1) 申请公布日期 2007.10.15
申请号 KR20060105803 申请日期 2006.10.30
申请人 SAMSUNG SDI CO., LTD. 发明人 KIM, EUI GYU;KIM, TAE HYUNG;HAN, W
分类号 H01L21/027 主分类号 H01L21/027
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