EIN CCVD-VERFAHREN ZUR HERSTELLUNG VON RÖHRENFÖRMIGEN KOHLENSTOFF-NANOFASERN

摘要

Catalytic chemical vapor deposition comprises applying a nickel- or cobalt-based catalyst layer to a carrier without using a current. The layer is thermally activated in a reducing atmosphere before depositing carbon in the gas phase. Preferred Features: The reducing atmosphere comprises a gas mixture containing hydrogen and/or delivering hydrogen. Thermal activation is carried out at 350-700 degrees C. The carrier consists of Al2O3 or an inert ceramic. The carrier has a layer containing centers of increased surface energy and is applied by CVD or PVD.