发明名称 FELDEFFEKTTRANSISTORSTRUKTUR UND HERSTELLUNGSVERFAHREN
摘要 A field effect transistor structure is formed with a body semiconductor layer (5) having source (9), body (7), drift region and drain (11). An upper semiconductor layer (21) is separated from the body by an oxide layer (17). The upper semiconductor layer (21) is doped to have a gate region (23) arranged over the body (7), a field plate region (25) arranged over the drift region 13 and at least one p-n junction (26) forming at least one diode between the field plate region (25) and the gate region (23). A source contact (39) is connected to both the source (9) and the field plate region (25).
申请公布号 AT375008(T) 申请公布日期 2007.10.15
申请号 AT20020708575T 申请日期 2002.03.20
申请人 NXP B.V. 发明人 PEAKE, STEVEN;GROVER, RAYMOND
分类号 H01L21/266;H01L29/78;H01L21/336;H01L21/8234;H01L27/02;H01L27/06;H01L29/06;H01L29/08;H01L29/40;H01L29/41;H01L29/423;H01L29/49;H01L29/786 主分类号 H01L21/266
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