| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processor capable of correctly obtaining deterioration of a chemical for soaking and processing a substrate. SOLUTION: The substrate processor for soaking the substrate in the chemical to remove a dissolved layer formed on the surface of the substrate includes: an arithmetic part 16 for calculating index value information 120 indicating a total of a dissolved layer material removed in a processing reservoir; and a determination part 17 for comparing threshold information 121 of the dissolved layer material stored in a memory device 12 with the index value information 120 calculated by the arithmetic part to determine the deterioration of the chemical in the processing reservoir. A driver 18 controls a liquid supply mechanism 4, valves 5 and a pump 6 to replace the chemical in the reservoir, in response to determination result information 122 of the determination part 17. COPYRIGHT: (C)2008,JPO&INPIT
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