| 摘要 |
Beading caused by interferences between block patterns, which are driving patterns of two nozzle arrays at the time of printing with the use of the two nozzle arrays for the same color, and a mask is reduced. Specifically, when the mask is created, repulsive potentials are calculated between the mask and planes with the block patterns. That is, when a placement of a print permitting area in the mask is determined, the repulsive potentials are calculated between the mask and dots in the planes with the block patterns, and then the print permitting area is placed on the most dispersive position with the lowest energy. This allows the print permitting areas to be well dispersed in terms of the overlaps between the block patterns and the mask.
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