| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure technology capable of correcting a non rotational symmetry aberration in a reproducible state without the possibility of causing a damage to an optical member. <P>SOLUTION: A projection optical system with a concave mirror 22 includes: a probe 27a arranged in a state that can be pressed into contact with the concave mirror 22; a coarse adjustment mechanism wherein a coarse adjustment micrometer 26A drives a plate spring 28a to drive the probe 27a in a direction pressed into contact with a projection 22a of the concave mirror 22; and an inching mechanism that controls a force of the probe 27a applied to the projection 22a by using an inching micrometer 26B to drive the plate spring 28b, after the probe 27a is pressed into contact with the projection 22a. <P>COPYRIGHT: (C)2008,JPO&INPIT |
