发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT AND SOURCE VOLTAGE/SUBSTRATE BIAS CONTROL CIRCUIT
摘要 This disclosure concerns a semiconductor integrated circuit that includes a semiconductor substrate, a plurality of well regions formed on one surface of the semiconductor substrate and electrically isolated from each other, a plurality of MOS transistors formed in the well regions and a substrate bias generator that applies substrate biases to the individual well regions based on actually measured process-derived variance of the MOS transistors in threshold voltage to bring the threshold voltages of the respective MOS transistors into conformity with a normal threshold voltage.
申请公布号 US2007236276(A1) 申请公布日期 2007.10.11
申请号 US20070764605 申请日期 2007.06.18
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 FUJITA TETSUYA;HAMADA MOTOTSUGU;HARA HIROYUKI
分类号 H01L27/04;H01L29/94;G05F3/20;H01L21/822;H01L21/8238;H01L27/092;H03K3/01;H03K17/00 主分类号 H01L27/04
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