发明名称 NITRIDE SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To achieve, for example, high brightness and efficiency of a light emitting device, and to achieve normally-off characteristics of a field effect transistor, by suppressing spontaneous polarization which occurs on a nitride semiconductor. <P>SOLUTION: A nitride semiconductor device includes a semiconductor laminate 110 made of a nitride semiconductor comprising a first main surface and a second main surface that faces it, and containing a channel layer 104. On the first main surface, a plurality of rough parts each having a plane orientation of ä0001} are formed, and the second main surface has a plane orientation of ä1-101}. The channel layer 104 is formed along ä1-101} in plane orientation. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007266577(A) 申请公布日期 2007.10.11
申请号 JP20070004222 申请日期 2007.01.12
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MATSUO HISAYOSHI;MORITA TATSUO;UEDA TETSUZO;UEDA DAISUKE
分类号 H01L21/338;H01L29/778;H01L29/812;H01L33/06;H01L33/12;H01L33/16;H01L33/22;H01L33/32;H01L33/40 主分类号 H01L21/338
代理机构 代理人
主权项
地址