| 摘要 |
<P>PROBLEM TO BE SOLVED: To simultaneously optimize behavior or work of each of both high frequency waves in a system of applying the two high frequency waves of different frequencies to a capacitive coupling electrode (especially, lower electrode). <P>SOLUTION: A susceptor 14 serving as both the lower electrode and a substrate holding base has an upper susceptor electrode 16 and a lower susceptor electrode 18 which are divided into two. A first high frequency wave of, for example, 2 MHz to be output from a first high-frequency power source 22 is supplied to the upper susceptor electrode 16 through a matching device 24, a power feeding rod 26, and a cylindrical power feeder 20; and is discharged toward a plasma space PS upper than a main surface (upper surface) of the upper susceptor electrode 16. A second high frequency wave of, for example, 40 MHz to be output from a second high-frequency power source 34 is supplied to the lower susceptor electrode 18 through a matching device 36 and a power feeding rod 38, and is discharged toward the plasma space PS upper than a main surface (upper surface) of the lower susceptor electrode 18. <P>COPYRIGHT: (C)2008,JPO&INPIT |
