| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a nanohole structure having regularly arrayed nanoholes formed without using dry etching. SOLUTION: The nanohole structure in which a plurality of the nanoholes 12 are formed is manufactured. A plurality of openings 6a penetrated through the surface of a material 4 to be worked are formed with a regularly arrayed pattern on a resist 6 provided on the material 4 to be worked. The same material as the material 4 to be worked is deposited in the openings 6a using the resist 6 as a mask to form projecting parts 10A having a thickness smaller than the depth of the openings 6a. The resist 6 on the material 4 to be worked is removed to remove the deposit on the resist 6. The material 4 to be worked is anodically oxidized in a state that the projecting part 10A remains on the surface of the material 4 to be coated to form the plurality of the nanoholes 12. COPYRIGHT: (C)2008,JPO&INPIT
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