| 摘要 |
A method and system for performing multiple depositions on a substrate using an improved Ionized Physical Vapor Deposition (IPVD) system that allows IPVD processes and plasma-enhanced processes, such as PEALD and PECVD, to be performed in a single processing chamber. A determination of the state of an in-coming substrate can be made by sensing the substrate automatically or interrogating data relating to the state of the substrate to arrive at the determination. A controller selects and executes a process in response to the determination using a processing apparatus configured to alternatively perform multiple processes in response to commands from the controller. |
