| 摘要 |
<p>A device and a method for measuring discharging uniformity of a slit nozzle in the width direction are provided to detect evenness in the width direction of a photoresist, which is formed on a substrate by the slit nozzle, simply and accurately. A device for measuring discharging uniformity of a slit nozzle in the width direction comprises a discharged fluid distributor(200) and a discharged fluid measuring unit(300). The discharged fluid distributor is installed to distribute discharged fluid from the slit nozzle(110) to each section in the width direction of the slit nozzle. The discharged fluid measuring unit is formed to detect the quantity of the discharged fluid distributed by the discharged fluid distributor.</p> |
