发明名称 |
METHOD OF MANUFACTURING POLISHING PAD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a polishing pad preventing leakage of slurry and improved in optical detection accuracy. <P>SOLUTION: This method of manufacturing a polishing pad 8 includes processes of: manufacturing a polishing region 9 formed from a polyurethane foam body; forming an opening part 14 structured of a through hole 12 and shelf parts 13 in the polishing region; manufacturing a projecting light transmitting region 10 thinner than the polishing region; providing the light transmitting region inside the opening part of the polishing region; and attaching a transparent support film 11 to a back surface side of the polishing surface of the polishing region. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2007260827(A) |
申请公布日期 |
2007.10.11 |
申请号 |
JP20060087985 |
申请日期 |
2006.03.28 |
申请人 |
TOYO TIRE & RUBBER CO LTD |
发明人 |
NAKAI YOSHIYUKI;OGAWA KAZUYUKI;KIMURA TAKESHI;KAZUNO ATSUSHI;SHIMOMURA TETSUO |
分类号 |
B24B37/20;C08G18/00;C08G101/00;C08J5/14;H01L21/304 |
主分类号 |
B24B37/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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