| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a radiation-sensitive resin composition having excellent solubility in an alkali development solution and excellent etching resistance and a copolymer useful for the radiation-sensitive resin composition. <P>SOLUTION: The copolymer is alkali-insoluble or sparingly alkali-soluble, made easily alkali-soluble by an acid action, has a weight-average molecular weight of 1,000-200,000 and comprises a repeating unit represented by formula (1) and repeating units represented by formulas (2) and (3). <P>COPYRIGHT: (C)2008,JPO&INPIT |
