| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning agent or a rinse agent for lithography having preferable dissolving and stripping properties on a resist, antireflection film or photospacer formed from an organic solvent solution. SOLUTION: The cleaning agent or rinse agent for lithography contains a cycloalkanol acetate which may have a substituent. Further, the agent may contain as an organic solvent, monopropyleneglycol alkylether, dipropyleneglycol alkylether, tripropyleneglycol alkylether, monopropyleneglycol alkyletheracetate, dipropyleneglycol alkyletheracetate, tripropyleneglycol alkyletheracetate, 1,3-butanediol alkylether, 1,3-butanediol alkyletheracetate, glycerin alkylether, glycerin alkyletheracetate or the like. COPYRIGHT: (C)2008,JPO&INPIT |
