发明名称 |
DEVICE SUBSTRATE WASHING METHOD |
摘要 |
<p>Disclosed is a device substrate washing method which can fully remove a resist attached to a device substrate, particularly a resist attached to a perforated part of a fine pattern which has a large aspect ratio. The method comprises a washing step for removing a resist attached to a device substrate with a solvent, wherein the solvent is a composition comprising at least one fluorinated compound selected from the group consisting of hydrofluoroether, hydrofluorocarbon and perfluorocarbon and a fluorinated alcohol.</p> |
申请公布号 |
WO2007114448(A1) |
申请公布日期 |
2007.10.11 |
申请号 |
WO2007JP57497 |
申请日期 |
2007.04.03 |
申请人 |
ASAHI GLASS COMPANY, LIMITED;NTT ADVANCED TECHNOLOGY CORPORATION;OKAMOTO, HIDEKAZU;NAMATSU, HIDEO |
发明人 |
OKAMOTO, HIDEKAZU;NAMATSU, HIDEO |
分类号 |
G03F7/42;C11D7/50;H01L21/027;H01L21/304 |
主分类号 |
G03F7/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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