| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having good alkali developability and giving a cured product having excellent heat resistance. <P>SOLUTION: The alkali developable photosensitive resin composition (Q) comprises a hydrophilic resin (A), a polyfunctional (meth)acrylate monomer (B), a compound (C) having two or more hydrolyzable alkoxy groups, a photo-radical polymerization initiator (D) and a photoacid generator (E), wherein the difference in solubility parameter between the polyfunctional (meth)acrylate monomer (B) and the compound (C) having two or more hydrolyzable alkoxy groups is -2.0 to 2.0. <P>COPYRIGHT: (C)2008,JPO&INPIT |
