| 摘要 |
PROBLEM TO BE SOLVED: To remove a resist suspended solid that shifts to a cleaning liquid and cannot be decomposed easily from the cleaning liquid effectively when cleaning a semiconductor substrate. SOLUTION: A semiconductor substrate cleaning system comprises: a clogging detection means 201 for arranging, in parallel, a plurality of filters 200a, 200b for capturing a resist shifted to the cleaning liquid by cleaning the semiconductor substrate, in a cleaning liquid transfer path 15 for transferring the cleaning liquid discharged from the cleaning device for cleaning the semiconductor substrate, and for detecting clogging in the filter; and a liquid leakage control means 220 for stopping liquid leakage to the filter in which clogging is detected and leaks liquid to other filters, when clogging is detected in one of the filters by the clogging detection means. As a result, the resist suspended solid generated by cleaning the semiconductor substrate is removed from the cleaning liquid effectively, and the filters are maintained without stopping the operation of the system, thus continuing a stable degree of cleaning. COPYRIGHT: (C)2008,JPO&INPIT
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