发明名称 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE, AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor memory device that reduces a capacity between floating electrodes adjacent to each other while securing a capacitive coupling property between a control electrode and the floating electrode, and to provide its manufacturing method. SOLUTION: The nonvolatile semiconductor memory device is provided with a semiconductor layer, gate insulating films provided on the semiconductor layer, the floating electrodes provided on the gate insulating films, the control electrode provided oppositely to the upper faces of the floating electrodes, first dielectric films respectively interposed between each upper face of the floating electrodes and the control electrode, and second dielectric films respectively provided adjacently to each side-face of the floating electrodes and composed of a dielectric body having a relative permittivity smaller than that of the first dielectric film. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007266119(A) 申请公布日期 2007.10.11
申请号 JP20060086381 申请日期 2006.03.27
申请人 TOSHIBA CORP 发明人 KINOSHITA SHIGERU
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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