发明名称 |
Inspection system by charged particle beam and method of manufacturing devices using the same |
摘要 |
An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers. |
申请公布号 |
US2007235644(A1) |
申请公布日期 |
2007.10.11 |
申请号 |
US20070806573 |
申请日期 |
2007.06.01 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
NAKASUJI MAMORU;NOJI NOBUHARU;SATAKE TOHRU;HATAKEYAMA MASAHIRO;KIMBA TOSHIFUMI;SOBUKAWA HIROSHI;YOSHIKAWA SHOJI;MURAKAMI TAKESHI;WATANABE KENJI;KARIMATA TSUTOMU;OOWADA SHIN;SAITO MUTSUMI;YAMAZAKI YUICHIRO;NAGAI TAKAMITSU;NAGAHAMA ICHIROTA |
分类号 |
G01N23/00;G01N23/225;H01J37/06;H01J37/073;H01J37/18;H01J37/20;H01J37/22;H01J37/244;H01J37/28 |
主分类号 |
G01N23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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