| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas distribution system for a post-etch treatment system. SOLUTION: A post-etch treatment system is described for removing photoresist remnants and etch residues formed during an etching process. For example, the etch residues may contain a material including halogens. The post-etch treatment system comprises a vacuum chamber, a radical generation system connected to the vacuum chamber, a radical gas distribution system that is connected to the radical generation system and configured to distribute reactive radicals above a substrate, and a high-temperature pedestal configured to be connected to the vacuum chamber and to support the substrate. COPYRIGHT: (C)2008,JPO&INPIT
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