Polarization influencing optical arrangement for e.g. projection lens system, has optical unit changing distribution in central area of beam cross section, where beam has approximate tangential polarization distribution in central area

摘要

The arrangement (300) has a polarization influencing optical unit (100) converting a given input polarization distribution of a light beam, which passes through the arrangement, with an exclusion of a partition of a light beam cross section into an approximate tangential polarization distribution. Another polarization influencing optical unit (200) changes the distribution in a central area of the beam cross section. The beam has the approximate tangential polarization distribution in the central area of the cross section. An independent claim is also included for a method for microlithographic manufacturing of microstructure components.