| 摘要 |
The present invention relates to a method to determine a position of at least one mark provided on a substrate, comprising the actions of: detecting a first mark on said substrate by using a first detector, detecting a first set of marks comprising at least a second mark on said substrate by using a second detector, computing a first list of relative distance(s) between said first mark and mark(s) in said first set of marks, detecting the second mark on said substrate by using one of said first or said second detectors, detecting a second set of marks comprising at least said first mark on said substrate by using an available detector, computing a second list of relative distance(s) between said second mark and mark(s) in said second set of marks, determining the position of at least one mark by using the information in said first and said second lists of relative distance(s).
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