发明名称 LASER BEAM MACHINING APPARATUS, LASER BEAM OPTICAL SYSTEM,LASER BEAM MACHING METHOD, AND METHOD FOR REPAIRING DEFECT OF ACTIVE MATRIX SUBSTRATE
摘要 <p><P>PROBLEM TO BE SOLVED: To mitigate the non-uniformity of the intensity distribution by the interference pattern of laser beams. <P>SOLUTION: A laser beam machining apparatus comprises a pulse laser beam oscillator 1, a slit 40 for limiting the laser beam flux, an illumination optical system 30 for uniformly illuminate the slit and a phase shift part 20, and an imaging lens 5 for performing the reduced projection of the laser beams passed through the slit 40 on an object 6 for machining. The laser beam flux is partitioned by the phase shift part 20 to shift the phase in a superposing manner on the slit 40, and uniform machining without any interference pattern is performed by suppressing the interference of the unified laser beam flux. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2007260694(A) 申请公布日期 2007.10.11
申请号 JP20060085827 申请日期 2006.03.27
申请人 SONY CORP 发明人 TAKADA MASAHIRO
分类号 B23K26/073;B23K26/00;B23K26/06;B23K26/067;B23K101/40;H01S3/10 主分类号 B23K26/073
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