| 摘要 |
PROBLEM TO BE SOLVED: To provide a polymer giving an insulation film having low relative dielectric constant and excellent CMP resistance and chemical liquid resistance, a method for producing the polymer, a composition for forming an insulation film, a method for producing an insulation film, and a silica-based insulation film. SOLUTION: The method for producing the polymer contains a step to perform the cocondensation of (A) at least one kind of silane compound expressed by general formula (1) with (B) at least one kind of silane compound selected from the compound expressed by general formula (2), R<SP>4</SP><SB>a</SB>SiX'<SB>4-a</SB>, and the compound expressed by general formula (3), R<SP>5</SP><SB>b</SB>Y'<SB>3-b</SB>Si-(R<SP>7</SP>)<SB>d</SB>-SiZ'<SB>3-c</SB>R<SP>6</SP><SB>c</SB>, in the presence of (C) a metal chelate compound and/or an acid catalyst. COPYRIGHT: (C)2008,JPO&INPIT
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