Microlithography projection objective for imaging radiation from object plane to image plane, has mirrored entry pupil in mirrored entry pupil plane obtained by mirroring entry pupil at object plane

摘要

The objective has a mirrored entry pupil in a mirrored entry pupil plane obtained by mirroring an entry pupil at an object plane. An illumination ray bundle traverses an illumination system of a microlithography projection exposure apparatus. An image-projecting ray path and the illumination ray bundle do not cross over each other in a meridional plane in a light path from the object plane to an image plane (2102). An intermediate image is formed in the light path from the object plane to the image plane.