发明名称 Solid state imaging device with increased vertical resolution in interlace scanning method
摘要 <p>A solid state imaging device comprises a semiconductor substrate defining a two-dimensional surface, a plurality of photoelectric conversion elements disposed in a light receiving area of said semiconductor substrate in a plurality of rows and columns, an electric charge read-out device that reads out signal electric charges accumulated in said plurality of photoelectric conversion elements in interlace by dividing the signal electric charges in a plurality of fields, each field at least including the signal electric charges accumulated in the vertically adjacent photoelectric conversion elements corresponding to one color, and a vertical adding device that adds, for each field, the read-out signal electric charges divided into the plurality of fields. A solid state imaging device that can increase vertical resolution at a time of an interlace operation is provided. </p>
申请公布号 EP1564813(A3) 申请公布日期 2007.10.10
申请号 EP20050003091 申请日期 2005.02.14
申请人 FUJIFILM CORPORATION 发明人 YAMADA, TETSUO
分类号 H01L27/148;H04N5/335;H04N5/341;H04N5/369;H04N5/3728;H04N9/04;H04N101/00 主分类号 H01L27/148
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