| 发明名称 |
METHOD FOR DETERMINATION OF THE PROCESS FINISHING POINT OF PLASMOCHEMICAL ETCHING |
| 摘要 |
The invention proposes a method for determination of the process finishing point of plasmochemical etching. Due to introduction of new procedures and relations between them it is achieved possibility for measuring small relative concentration of excited plasma particles that leads to sensitivity enhancement and increase of control reliability of target process.
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| 申请公布号 |
UA26976(U) |
申请公布日期 |
2007.10.10 |
| 申请号 |
UA20070006553 |
申请日期 |
2007.06.11 |
| 申请人 |
VINNYTSIA NATIONAL TECHNICAL UNIVERSITY |
发明人 |
KRAVCHENKO YURII STEPANOVYCH;OSADCHUK VOLODYMYR STEPANOVYCH;OSADCHUK OLEKSANDR VOLODYMYROVYCH |
| 分类号 |
H01L21/302 |
主分类号 |
H01L21/302 |
| 代理机构 |
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