METHOD AND APPARATUS FOR PERFORMING DARK FIELD DOUBLE DIPOLE LITHOGRAPHY(DDL)

摘要

A method and an apparatus for performing a dark field double dipole lithography process are provided to improve the accuracy of modeled OPC(Optical Proximity Compensation) results by adopting a quasi-rigorous approach such as a boundary layer method. A target pattern having plural features containing horizontal and vertical features is recognized. A horizontal mask containing low-contrast features is generated based on the target pattern. A bias of the low-contrast pattern in the horizontal mask is optimized. Scatter bars are applied on the horizontal mask. A vertical mask containing low-contrast features is generated based on the target pattern. A bias of the low-contrast pattern in the vertical mask is optimized. Scatter bars are applied on the vertical mask.