| 发明名称 |
Method of aligning and exposing a substrate |
| 摘要 |
<p>Correcting for misalignment of a substrate before it is exposed is performed using offset corrections and process corrections that are calculated based on alignment offset measurements of alignment marks and overlay measurements of overlay targets on substrates in previous batches.</p> |
| 申请公布号 |
EP1843210(A2) |
申请公布日期 |
2007.10.10 |
| 申请号 |
EP20070251283 |
申请日期 |
2007.03.26 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
WERKMAN, ROY;MOS, EVERHARDUS CORNELIS |
| 分类号 |
G03F9/00;G03F7/20 |
主分类号 |
G03F9/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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