发明名称 |
EXPOSURE DEVICE, EXPOSURE METHOD, AND MICRO DEVICE MANUFACTURING METHOD |
摘要 |
An exposure apparatus for exposure-transferring an image of a pattern projected through an optical system having a plurality of optical units L1 to L13 onto an object P, comprises a correcting device which corrects a position of at least one of a plurality of images to be projected onto the object P by the plurality of optical units L1 to L13 so that displacements of the optical units L1 to L13 are compensated.
|
申请公布号 |
EP1843204(A1) |
申请公布日期 |
2007.10.10 |
申请号 |
EP20060712217 |
申请日期 |
2006.01.24 |
申请人 |
NIKON CORPORATION |
发明人 |
KATO, MASAKI;SHIMIZU, KENJI;TOGUCHI, MANABU;WATANABE, TOMOYUKI |
分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|