Lithographic apparatus and device manufacturing method

摘要

A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table (WT) configured to hold a substrate (W), the substrate table comprising a conditioning system (100) configured to hold a conditioning fluid and to condition the substrate table, wherein the conditioning system comprises a pressure damper (104,105) in fluid communication with the conditioning system and arranged to dampen a pressure variation in the conditioning system.