发明名称 |
Thin film formation apparatus and method of manufacturing self-light-emitting device using thin film formation apparatus |
摘要 |
A means of effectively applying an organic EL material application liquid with good application liquid cut-off is provided. A heater and an ultrasonic oscillator are formed in a thin film formation apparatus when applying the application liquid, and heat and ultrasonic oscillations are imparted to the application liquid. Defective application liquid cut-off and liquid clogging can thus be resolved.
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申请公布号 |
US7279194(B2) |
申请公布日期 |
2007.10.09 |
申请号 |
US20010776472 |
申请日期 |
2001.02.02 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
HIROKI MASAAKI;SHIBATA NORIKO;YAMAZAKI SHUNPEI |
分类号 |
B05D5/06;H01L27/32;H01L51/40 |
主分类号 |
B05D5/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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