发明名称 Thin film formation apparatus and method of manufacturing self-light-emitting device using thin film formation apparatus
摘要 A means of effectively applying an organic EL material application liquid with good application liquid cut-off is provided. A heater and an ultrasonic oscillator are formed in a thin film formation apparatus when applying the application liquid, and heat and ultrasonic oscillations are imparted to the application liquid. Defective application liquid cut-off and liquid clogging can thus be resolved.
申请公布号 US7279194(B2) 申请公布日期 2007.10.09
申请号 US20010776472 申请日期 2001.02.02
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 HIROKI MASAAKI;SHIBATA NORIKO;YAMAZAKI SHUNPEI
分类号 B05D5/06;H01L27/32;H01L51/40 主分类号 B05D5/06
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