METHOD FOR AUTOMATIC ALIGNMENT OF WAFER

摘要

A method for automatically aligning a wafer is provided to improve the stability and reliability of alignment by using transform equations of matrix and coordinates. An align error is measured to align a reference pattern and a wafer pattern mounted in a wafer measuring step(S440). A horizontal transform matrix and a translation transform matrix are calculated according to the calculated align error, and a correcting value of the pattern is determined by using coordinates transform of the matrix(S450). A wafer is aligned by utilizing the determined correcting value(S460). The above steps are repeated so that the align error of the wafer satisfies the allowable range(S470,S480).