| 摘要 |
A pixel position specifying method in an image forming device, the method measuring positions of exposure beams of the respective exposure heads and specifying pixel positions of junctures of the exposure heads, the method includes: using a beam position detecting mechanism to measure the positions of the exposure beams; detecting a first exposure beam position on an image receiving surface provided at the beam position detecting mechanism, by turning on a first connecting pixel near a juncture of a first exposure head; detecting a second exposure beam position on the image receiving surface, by turning on a second connecting pixel near a juncture of a second exposure head and moving the beam position detecting mechanism in the Y axis direction; and specifying connecting pixel positions from a moving amount of the beam position detecting mechanism in the Y axis direction and positions of exposure beams of the exposure heads.
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