| 摘要 |
<p>A measurement method and apparatus, and an exposure apparatus are provided to measure the wavefront aberration of an optical system precisely by using a system parameter obtained from a design value to define the construction of the measurement apparatus. A measurement method includes the steps of: measuring and memorizing a system parameter representing a difference from a design value to define the constructions of a projection optical system and the measurement apparatus(1100), wherein the system parameter includes a process parameter and an offset parameter; calling a process parameter among the measured and memorized system parameters(1200); extracting the wavefront aberration of the projection optical system by using the extracted process parameter(1300); and reflecting the offset parameter on the wavefront of the calculated projection optical system(1400).</p> |
