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发明名称
Manufacturing Method of Semiconductor Device Using Immersion Lithography Process
摘要
申请公布号
KR100764416(B1)
申请公布日期
2007.10.05
申请号
KR20050075419
申请日期
2005.08.17
申请人
发明人
分类号
H01L21/027;G03F7/00
主分类号
H01L21/027
代理机构
代理人
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