发明名称 ARRANGEMENT METHOD FOR DEPOSITION APPARATUS OF POINT SOURCE AND DEPOSITION APPARATUS
摘要 A deposition apparatus and a method for arranging a point evaporation source of the same are provided to improve the deposition efficiency of a deposition material by arranging point evaporation sources gradually getting bigger from an outside to a center. A deposition apparatus includes a plurality of point evaporation sources(120) installed therein. The point evaporation sources are arranged in a line. A substrate is positioned above the point evaporation sources. Perpendicular distances from the point evaporation sources to the substrate are different from each other. The point evaporation sources positioned at an outermost part are gradually installed at positions higher than the position of the point evaporation source positioned at a center part. A plurality of elevation units(122) are installed at lower parts of the point evaporation sources.
申请公布号 KR20070097632(A) 申请公布日期 2007.10.05
申请号 KR20060027766 申请日期 2006.03.28
申请人 MOON, DAE KYU 发明人 MOON, DAE KYU
分类号 H01L21/20;H01L21/205 主分类号 H01L21/20
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