APPARATUS FOR EXPOSING WAFER EDGE AND EXPOSING METHODE USED THE SAME

摘要

An apparatus for exposing a wafer edge and a wafer edge exposure method using the same are provided to reduce an exposure process time by totally exposing a photoresist formed on the wafer edge. A light source(110) generates light to expose a photoresist coated on a wafer(150) and outputs incident light in one direction. An exposure mask(130) is formed to shield partially the light in order to transfer selectively the incident light generated from the light source to a wafer edge. A wafer stage(140) is formed to align and support the wafer in order to expose the wafer edge to the light transferred from the exposure mask. An optic system(120) enlarges or reduces the light to the exposure mask and transfers the enlarged light or the reduced light.