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发明名称
Preparing method of semiconductor device comprising process for mask pattern of ion implantation
摘要
申请公布号
KR100764426(B1)
申请公布日期
2007.10.05
申请号
KR20050135457
申请日期
2005.12.30
申请人
发明人
分类号
H01L21/027
主分类号
H01L21/027
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代理人
主权项
地址
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