发明名称 NITRIDE SEMICONDUCTOR DEVICE
摘要 A nitride semiconductor device is provided to prevent degradation of the reunion efficiency due to the piezoelectric effect inducing spontaneous polarization, thereby improving the quantum well structure. A nitride semiconductor device includes a p-type nitride layer(32), an n-type nitride layer(37), and an active layer(35). The active layer(35) is formed between the p-type nitride layer(32) and the n-type nitride layer(37), and has a plurality of quantum well layers(35b) and at least one quantum barrier layer(35a) alternatively laminated. The active layer(35) has a polarization buffer layer(35c) formed between the quantum well layers(35b) and the quantum barrier layers(35a), and includes a band gap between the band gap of the quantum well layers(35b) and the band gap of the quantum barrier layers(35a).
申请公布号 KR20070098031(A) 申请公布日期 2007.10.05
申请号 KR20060029164 申请日期 2006.03.30
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 HAN, JAE WOONG;KIM, MIN HO
分类号 H01L33/06;H01L33/04 主分类号 H01L33/06
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