发明名称 DEPOSITION APPARATUS
摘要 A deposition apparatus that can secure uniformity of a thin film and improve deposition efficiency of a deposition material by forming opening holes of a linear evaporation source such that a height difference of the opening holes is gradually increased as it goes from an outer side to the center of the linear evaporation source, thereby adjusting heights of the opening holes is provided. In a deposition apparatus having a linear evaporation source(120) formed therein, the deposition apparatus comprises: a crucible(130) which is installed in the linear evaporation source, and formed in a longitudinally extending shape, and in which an organic material is filled; and a cover member(124) which is installed above the crucible, and has a plurality of opening holes(124a) formed in a surface thereof, wherein the opening holes are formed in the cover member in such a way that perpendicular distances between the respective opening holes and a substrate spaced upward from the linear evaporation source and formed parallel to the linear evaporation source are different from one another.
申请公布号 KR20070097633(A) 申请公布日期 2007.10.05
申请号 KR20060027767 申请日期 2006.03.28
申请人 MOON, DAE KYU 发明人 MOON, DAE KYU
分类号 C23C14/24 主分类号 C23C14/24
代理机构 代理人
主权项
地址