| 摘要 |
An apparatus and a method for coating a polyimide layer are provided to improve a pin hole defect or linear stain by removing polyimide liquid remained on an inkjet head. An apparatus for coating a polyimide layer includes a print table(100) where a substrate(120) is placed, an inkjet head(110) which is placed in an upper part of the print table and has nozzles for jetting polyimide liquid to the substrate, a polyimide liquid supply tank(102) where a container filled with the polyimide liquid is loaded, a wafer(130) which is installed to move as being contacted with a jet surface of the inkjet head having the nozzles, cleans the jet surface and is configured so as to be barreled in cleaning liquid through rotation, a cleaning liquid supply tank(103) where a container filled with the cleaning liquid is loaded, and a wafer cleaning bar(140) which is installed so as to be contacted with a side of the wafer contacted with the inkjet head and removes the cleaning liquid remained on the wafer.
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